Title:
シリカ膜形成用組成物、シリカ膜の製造方法およびシリカ膜
Document Type and Number:
Japanese Patent JP6687418
Kind Code:
B2
Abstract:
A composition for forming a silica layer includes a silicon-containing polymer and a mixed solvent including at least two solvents, wherein the mixed solvent has a surface tension of about 5 mN/m to about 35 mN/m at a temperature of about 25° C.
Inventors:
Zhang Shun Ei
Youn
Kim Yu
Ken Roh
Lee Yin
Guo Sawa Hide
Gold faith
Gold Haneul
Luo Taka
Yes Jin Nozomi
Xu Jin rain
Huang Hei Kyu
Youn
Kim Yu
Ken Roh
Lee Yin
Guo Sawa Hide
Gold faith
Gold Haneul
Luo Taka
Yes Jin Nozomi
Xu Jin rain
Huang Hei Kyu
Application Number:
JP2016036077A
Publication Date:
April 22, 2020
Filing Date:
February 26, 2016
Export Citation:
Assignee:
SAMSUNG SDI Co., LTD.
International Classes:
C01B33/12; H01L21/312
Domestic Patent References:
| JP2014213317A | ||||
| JP2011515835A | ||||
| JP56049540A | ||||
| JP2013001721A |
Foreign References:
| US20150093545 | ||||
| WO2016047362A1 | ||||
| WO2015083660A1 | ||||
| WO2012067230A1 |
Attorney, Agent or Firm:
Hatta International Patent Corporation