Title:
ケイ素粒子の改質方法
Document Type and Number:
Japanese Patent JP6844014
Kind Code:
B2
Abstract:
The invention relates to methods for producing non-aggregated, modified silicon particles by treating non-aggregated silicon particles which have volume-weighted particle size distributions with diameter percentiles d50 of 1.0 μm to 10.0 μm at 80° C. to 900° C. with an oxygen-containing gas.
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Inventors:
Yantke, Dominique
Bernhard, Rebecca
Giggler, Peter
Stoller, Jurgen
Bernhard, Rebecca
Giggler, Peter
Stoller, Jurgen
Application Number:
JP2019542778A
Publication Date:
March 17, 2021
Filing Date:
October 25, 2016
Export Citation:
Assignee:
Wacker Chemie AG
International Classes:
C01B33/02; H01M4/134; H01M4/36; H01M4/38
Domestic Patent References:
| JP2011065796A | ||||
| JP2016530189A | ||||
| JP2001148248A |
Foreign References:
| US20050031958 | ||||
| WO2015117838A1 |
Other References:
A.Touidjine et al.,Partially Dxidized Silicon Particles for Stable Aqueous Slurries and Practical Large-Scale Making of Si-Based Electrodes,Journal of the Electrochemical Society,2015年,vol.162, no.8,A1466-A1475
Shepherd M. et al.,Suppressing Hydrogen Evolution by Aqueous Silicon Powder Dispersions by Controlled Silicon Surface Oxidation,Propellants, Explosives, Pyrotechnics,2013年,vol.38,48-55
Shepherd M. et al.,Suppressing Hydrogen Evolution by Aqueous Silicon Powder Dispersions by Controlled Silicon Surface Oxidation,Propellants, Explosives, Pyrotechnics,2013年,vol.38,48-55
Attorney, Agent or Firm:
Kawaguchi International Patent Office