Title:
露光装置
Document Type and Number:
Japanese Patent JP6876218
Kind Code:
B2
Abstract:
The present invention enables high-resolution lithography. An exposure device uses a reading unit to read a correction substrate, which has a substrate correction pattern containing a plurality of two-dimensionally arrayed cross-mark positions drawn thereon, in an initial state and states with the correction substrate rotated by substantially 90°, 180°, and 270° from the initial state, and prepares a correction table used for correcting plotting information on the basis of the results of reading the correction substrate. In addition, the exposure device reads the cross pattern in a template using the reading unit and compares the results of reading with the correction table to prepare a template correction table relating to the deformation of the template. During a plotting process, the exposure device: corrects the plotting information on the basis of the correction table; irradiates the template with light from a light illumination unit while a drive unit moves a mask holding unit; acquires positional deviations in the first and second directions of the light illumination unit on the basis of an image captured by a camera; corrects the plotting information on the basis of the positional deviations in the first and second directions and the template correction table; and adjusts the time for outputting a signal to the light illumination unit.
Inventors:
Ryo Yonezawa
Application Number:
JP2017170684A
Publication Date:
May 26, 2021
Filing Date:
September 05, 2017
Export Citation:
Assignee:
Buoy Technology Co., Ltd.
International Classes:
G03F7/20; G01B11/00; H01L21/68
Domestic Patent References:
| JP10161296A | ||||
| JP2013520699A | ||||
| JP2014197136A | ||||
| JP2009175276A | ||||
| JP2012253325A | ||||
| JP2015029121A | ||||
| JP2000012459A | ||||
| JP2012054362A |
Foreign References:
| WO2017169455A1 |
Attorney, Agent or Firm:
Yukari Sakata