Title:
感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、フォトマスク製造用感活性光線性又は感放射線性樹脂組成物、及びフォトマスクの製造方法
Document Type and Number:
Japanese Patent JP7398551
Kind Code:
B2
Abstract:
According to the present invention, it is possible to provide an actinic ray-sensitive or radiation-sensitive resin composition containing a resin of which a solubility in a developer changes by the action of an acid, a photoacid generator (A) that has a group having a polarity which changes through decomposition by the action of an acid, a photoacid generator (B) that generates an acid having a higher pKa than an acid generated from the photoacid generator (A), and a basic compound; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, a method for manufacturing an electronic device, an actinic ray-sensitive or radiation-sensitive resin composition for manufacturing a photomask, and a method for manufacturing a photomask, each of which uses the composition.
Inventors:
Hideyuki Ishihara
Toshiya Takahashi
Taro Miyoshi
Toshiya Takahashi
Taro Miyoshi
Application Number:
JP2022511785A
Publication Date:
December 14, 2023
Filing Date:
March 12, 2021
Export Citation:
Assignee:
Fujifilm Corporation
International Classes:
G03F7/004; C07C309/42; C07C309/58; C07C381/12; C07D209/42; C07D231/26; C07D235/18; C07D251/70; C07D275/06; C07D309/12; C07D487/04; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2014153440A |
Foreign References:
| WO2020045534A1 | ||||
| WO2018070327A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Koei Office