Document Type and Number:
Japanese Patent JPWO2020202969
Kind Code:
A1
Abstract:
The present invention provides a method for manufacturing an electroconductive pattern having an excellent electric conductivity in a low temperature of 100°C or below. Provided is a method for manufacturing an electroconductive pattern having: (1) a step for forming a pattern including electroconductive particles (a) and a resin (b) on a substrate; and (2) a step for bringing an acidic aqueous solution into contact with the formed pattern, the acidic aqueous solution containing at least one type of salt in which the acid dissociation constant (pKa) of a conjugate acid of anions at 25°C is 1.0 or below, and having a pH at 25°C of 1.2 to 3.5.
Application Number:
JP2020513351A
Publication Date:
October 08, 2020
Filing Date:
March 02, 2020
Export Citation:
Domestic Patent References:
| JP2008277250A | 2008-11-13 | |||
| JP2012216535A | 2012-11-08 | |||
| JP2009155712A | 2009-07-16 | |||
| JP2010272402A | 2010-12-02 | |||
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