To provide a monomer excellently suitable as a raw material for a photoresist for semiconductor lithography exhibiting low birefringence, high optical transparency, excellent solubility in solvents and high hydrolyzability by an alkali or the like.

The alicyclic lactone compound is represented by formula [1]. The manufacturing method of the alicyclic lactone compound comprises heating 5-norbornene-2,3-dicarboxylic acid compound represented by formula [4], a cyclic ether compound represented by formula [5] and/or an ethylene glycol compound represented by formula [6] in the presence of a heteropolyacid catalyst containing tungsten metal to cause them to react. In the formulae, R1-R3 are each a hydrogen atom or a 1-10C alkyl group; R4 is a hydrogen atom or a 1-6C alkyl group; p is an integer of 1-10; n is an integer of 2-10; and m is an integer of 1-5.