Title:
ALIGNER
Document Type and Number:
Japanese Patent JP3604801
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To ralionalize the periodic confirmation and the correcting work of a high precision aligner in such a manner that the load and the hour are made as little as possible.
SOLUTION: This aligner is equipped with the following; a mask alignment system 2 for aligning a mask with a mask reference mark, TTL on-axis alignment systems 2, 2' for aligning a mask and a wafer via a projection lens, wafer stages 12-14 capable of moving in the XYθ direction and the Z direction, and a stage position measuring means 17. By aligning mask side reference patterns 3A, 3B and calibration marks by using the TTL on-axis aligment systems 2, 2', the coordinates of the mask and the magnification error of the projection lens are obtained. By the automatic correction, the periodic confirmation and the correcting work of equipment are rationalized. As a mask side reference pattern, a pattern on an aligned mask or a pattern newly formed on a part member wherein a mask reference mark is formed is used.
Inventors:
Shigeki Ogawa
Shigeyuki Uzawa
Shigeyuki Uzawa
Application Number:
JP9469296A
Publication Date:
December 22, 2004
Filing Date:
March 26, 1996
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F9/00
Domestic Patent References:
| JP6097031A | ||||
| JP6097032A |
Attorney, Agent or Firm:
Tetsuya Ito