To provide an antireflection film having efficient durability, an antireflection characteristics having a maximum reflectance of at most 0.2% even in consideration of a variation in production at a wavelength of 400-700 nm, and spectral reflection characteristics which are excellent in production stability.

The antireflection film comprises SiO2 and TiO2 which alternately overlap one another to form eleven layers on a base board having a refractive index of 1.4-2.2 at a wavelength of 550 nm, wherein the SiO2 and TiO2 are alternately, sequentially arranged in this order from the base board side. In this case, the uppermost layer is a SiO2 layer, and the whole physical film thickness is 500-630 nm.