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Title:
APPARATUS AND METHOD FOR TREATING SOLN., AND SEMICONDUCTOR TREATING APPARATUS
Document Type and Number:
Japanese Patent JP2000012501
Kind Code:
A
Abstract:

To reduce a space and mix circulation time by mixing a first liq. with mixture of the first liq. and second liq. in piping.

To a mixer unit 10 for mixing chemical liqs., pure water is fed from a pure water feed hole 11 as a main liq., desired chemical liqs. are fed from respective chemical liq. feed holes 12-14. The same pure water as the main liq. is fed from a stirring pure water feed hole 15 for stirring the soln. with the flow of the pure water, thereby obtaining a uniform mixed liq. In pure water and chemical liq. pipings, flow rate control valves are mounted and flow-meters may be provided in the respective piping routes for confirming the flow rates, and he mixed soln. is fed from a mixed liq. outlet 16 via a valve to a processing bed to clean wafers. As a result, it is possible to make the uniform mixing in the pipe of a normal aperture used for pipings and reduce the space and mixing circulation time because a circulation mixing mechanism can be dispersed with.


Inventors:
NISHIZAKI MITSUHIRO
Application Number:
JP17002798A
Publication Date:
January 14, 2000
Filing Date:
June 17, 1998
Export Citation:
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Assignee:
SONY CORP
International Classes:
B08B3/08; B01F5/00; H01L21/304; (IPC1-7): H01L21/304; B01F5/00; B08B3/08
Attorney, Agent or Firm:
Takashi Shibuya