METHOD AND SYSTEM FOR PROCESSING SUBSTRATE

Title:

METHOD AND SYSTEM FOR PROCESSING SUBSTRATE

Document Type and Number:

Japanese Patent JP2000012500

Kind Code:

A

Abstract:

To enhance cleaning power significantly by enhancing the activity of cleaning liquid.

In a method for cleaning a substrate by supplying cleaning liquid S dissolved with ozone from a nozzle 7 to a substrate W, the cleaning liquid S being fed to the substrate W is irradiated with UV-rays from a UV irradiating section 31. The cleaning liquid S containing ozone enters into excited state as represented by 'O3 → O(3P)+O2' and oxygen radicals can be obtained with low energy. Since oxygen radicals can be generated easily, activity of the cleaning liquid can be enhanced and cleaning power of the cleaning liquid can be enhanced significantly.

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Inventors:

HIRAE SADAO
SATO MASANOBU
YASUDA SHUICHI

Application Number:

JP32180598A

Publication Date:

January 14, 2000

Filing Date:

November 12, 1998

Export Citation:

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Assignee:

DAINIPPON SCREEN MFG

International Classes:

B08B3/02; H01L21/304; (IPC1-7): H01L21/304; B08B3/02; H01L21/304

Attorney, Agent or Firm:

Tsutomu Sugitani

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