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Title:
ASYMMETRIC ETHYLIDENE POLYHYDRIC PHENOLS AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2002037750
Kind Code:
A
Abstract:

To obtain an asymmetric ethylidene polyhydric phenol useful as a raw material for a resin component of a photoresist material, a photosensitizer, a dissolution inhibitor, an additive, or the like, a raw material for a polymer having a nonlinear structure or a crosslinking structure, or the like, or a raw material for a crosslinking agent, or the like, and to provide a method for producing the same.

4-(1-Hydroxyethyl)phenol is reacted with a phenol compound in the presence of an acid catalyst to produce an asymmetric ethylidene polyhydric phenol of general formula (1).


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Inventors:
MAEDA TOYOHIKO
MORITA YOSHIYUKI
SHIOMI TAIICHI
Application Number:
JP2001146951A
Publication Date:
February 06, 2002
Filing Date:
May 16, 2001
Export Citation:
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Assignee:
HONSHU CHEMICAL IND
International Classes:
C07C39/17; C07B61/00; C07C37/11; C07C39/16; (IPC1-7): C07C39/17; C07C37/11; C07C39/16
Attorney, Agent or Firm:
Yoshihiro Kodama



 
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