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Patent Searching and Data


Title:
ATMOSPHERIC PRESSURE PLASMA TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP2004355921
Kind Code:
A
Abstract:

To provide a normal pressure plasma treatment device in which a plasma treatment space can be sucked equally.

The normal pressure plasma treatment space 1a is formed between the upper and the lower electrode units 10, 20 (treatment space formation). A suction means 31 to suck and discharge a treated gas is installed at the brim part 1 of the space 1a. The suction means 31 has a chamber 37 to be ranged via an suction port in the plasma treatment space 1a. The chamber 37 is divided into the end side chamber part 37a corresponding to both end sides of the brim part 1 and the intermediate chamber part 37b corresponding to the intermediate side of the brim part of 1. A discharge pump 40 stands in a row in each chamber parts 37a, 37b.


Inventors:
YASHIRO SUSUMU
Application Number:
JP2003151199A
Publication Date:
December 16, 2004
Filing Date:
May 28, 2003
Export Citation:
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Assignee:
SEKISUI CHEMICAL CO LTD
International Classes:
H05H1/24; B01J19/08; C23C16/455; C23C16/515; C23F4/00; H01L21/205; H01L21/3065; (IPC1-7): H05H1/24; B01J19/08; C23C16/455; C23C16/515; C23F4/00; H01L21/205; H01L21/3065