CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023166338

Kind Code:

A

Abstract:

To provide a resist composition from which a resist pattern having good CD uniformity can be produced.SOLUTION: There are provided: a salt of a sulfonium cation of a specific structure and a carboxylate of a specific structure, the carboxylate having an ethylenically unsaturated bond; and a resist composition containing the same.SELECTED DRAWING: None

Inventors:

NOJO WATARU
SAITO MARINA
ICHIKAWA KOJI

Application Number:

JP2023075881A

Publication Date:

November 21, 2023

Filing Date:

May 01, 2023

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C07C69/54; C07C381/12; C08F20/10; C09K3/00; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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