SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023166339

Kind Code:

A

Abstract:

To provide a salt which allows a resist pattern having a good pattern collapse margin to be produced, an acid generator, a resin, and a resist composition containing the same.SOLUTION: There are provided: a salt represented by a specific formula and the like; and a resist composition containing the same.SELECTED DRAWING: None

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Inventors:

NOJO WATARU
SAITO MARINA
ICHIKAWA KOJI

Application Number:

JP2023075882A

Publication Date:

November 21, 2023

Filing Date:

May 01, 2023

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C07C309/12; C07C309/17; C07C381/12; C07D307/00; C07D313/06; C08F220/20; C09K3/00; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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