カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法

Title:

カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP2024055819

Kind Code:

A

Abstract:

【課題】良好なＤＯＦを有するレジストパターンを製造することができるカルボン酸塩、レジスト組成物等を提供する。【解決手段】式（Ｉ）で表されるカルボン酸塩、カルボン酸発生剤及びレジスト組成物。TIFF2024055819000244.tif59159［式中、ＸはＳ又はＩ；ｍ１０は０又は１；Ａｒ１－Ａｒ３は其々芳香族炭化水素基；Ｒ１－Ｒ３は其々＊－Ｏ－Ｒ１０、＊－Ｏ－ＣＯ－Ｒ１０等；Ｒ１０は置換／非置換の脂環式炭化水素基；等々を表す。］【選択図】なし

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Inventors:

Hiroshi Nakamura
Risa Yasue
Koji Ichikawa

Application Number:

JP2023172721A

Publication Date:

April 18, 2024

Filing Date:

October 04, 2023

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

G03F7/004; C07C62/22; C07C62/24; C07D321/10; C09K3/00; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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