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Title:
CATIONIC RESIN-MODIFIED SILICA-DISPERSED LIQUID
Document Type and Number:
Japanese Patent JP2006069870
Kind Code:
A
Abstract:

To provide a cationic resin-modified silica-dispersed liquid having a silica concentration of ≥22 wt.% and also having high transparency and excellent preservation stability by using wet silica as a raw material and to provide its manufacturing method.

In the method for manufacturing the cationic resin-modified silica-dispersed liquid having an average particle size of ≤300 nm, a silica slurry obtained by adding a wet silica having 170-230 m2/g BET specific surface area to a polar solvent so that the silica concentration may be ≥22 wt.% is atomized by a wet medium type pulverizer using a ceramic bead having the average particle size of less than 0.2 mm as a medium so that the average particle size of the wet silica particles may be ≤1 μm, then the slurry is mixed with a cyclic ammonium salt type cationic resin having an average molecular weight of less than 50,000 and also a colloid equivalent value of ≥4.0 meq/g, and the mixture is subjected to dispersion treatment by a high pressure homogenizer.


Inventors:
FUKUNAGA KENJI
TAGASHIRA YOSHINORI
Application Number:
JP2004258136A
Publication Date:
March 16, 2006
Filing Date:
September 06, 2004
Export Citation:
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Assignee:
TOKUYAMA CORP
International Classes:
C01B33/149; C09C1/28; C09C3/10; C09D17/00; C09K3/14
Domestic Patent References:
JP2003253080A2003-09-10
JP2004174810A2004-06-24
JP2004050811A2004-02-19
JP2001019421A2001-01-23
JP2000239536A2000-09-05