Title:
CERAMIC HEATER FOR SEMICONDUCTOR MANUFACTURING/ INSPECTING EQUIPMENT
Document Type and Number:
Japanese Patent JP2002319527
Kind Code:
A
Abstract:
To provide a ceramic heater for semiconductor manufacturing/ inspecting equipment capable of uniformly heating a semiconductor wafer without generating a scattered temperature and capable of rapidly raising the temperature of a semiconductor wafer in a semiconductor manufacturing/inspecting process.
This ceramic heater for semiconductor manufacturing/inspecting equipment comprises a ceramic substrate, on the surface or inside of which resistive heating elements are formed. At least on the surface of the wafer- heating-face side of a ceramic substrate, a groove having a circular shape in plan view is formed, wherein the groove is divided in circumferential direction.
Inventors:
AMINO TOSHIKAZU
Application Number:
JP2001124879A
Publication Date:
October 31, 2002
Filing Date:
April 23, 2001
Export Citation:
Assignee:
IBIDEN CO LTD
International Classes:
H05B3/20; H01L21/02; H01L21/66; (IPC1-7): H01L21/02; H01L21/66; H05B3/20
Attorney, Agent or Firm:
Yasuo Yasutomi (2 outside)