Title:
CHARGE BEAM EXPOSING METHOD AND MASK
Document Type and Number:
Japanese Patent JPH10209007
Kind Code:
A
Abstract:
To provide a charge beam exposing method for enabling the protective exposure of alignment marks, without deteriorating the throughput.
A charge beam B is radiated on the all alignment marks in alignment mark regions 22a, 22b to do the protective exposure of the alignment marks for all patterns in subfields 510 involved in a main field 51a during continuous moving of the masks before/after the pattern exposure in the main field 51a, resulting in that no protective exposure step is needed prior to the exposure step as before.
Inventors:
MORITA KENJI
Application Number:
JP844297A
Publication Date:
August 07, 1998
Filing Date:
January 21, 1997
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F1/20; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F1/16; G03F7/20
Attorney, Agent or Firm:
Fuyuki Nagai
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