CHARGED PARTICLE BEAM OPTICAL DEVICE, DIAPHRAGM FOR CHARGED PARTICLE BEAM OPTICAL DEVICE, CHARGED PARTICLE BEAM CONTROL METHOD, AND OBJECT INSPECTING DEVICE, OBJECT INSPECTING METHOD, AND SEMICONDUCTOR ELEMENT USING THESE

Japanese Patent JP3926621

B2

PROBLEM TO BE SOLVED: To provide a charged particle beam optical device capable of reducing expansion of a charged particle beam due to aberration in an image surface.
SOLUTION: A secondary column 2 having a secondary optical system 20 is provided to form an image IF of an illuminated range OF on an object surface OB on an image surface IM by introducing a secondary beam emitted from the illuminated range OF extended in an X-axis direction on the object surface OB. At this time, an aperture diaphragm AS having an oval aperture form having a longer axis in a Y-axis direction perpendicular to the X-axis direction in which the illuminated range OF is extended is provided on a track of the secondary beam. The ratio of the longer axis and the shorter axis of the aperture form are set in such a way that the secondary beam emitted from a point A' at an end part of the range OF in the X-axis direction where the illuminated range OF is extended has extension δx and δy by aberration of roughly similar size respectively in the X-axis direction where the image IF is extended and the Y-axis direction perpendicular to that on the image surface IM.

Renmei

JP2001392552A

June 06, 2007

December 25, 2001

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Ebara Corporation
NIKON CORPORATION

G01B15/00; H01J37/09; G01B15/08; G01N23/225; G21K1/02; G21K5/04; H01J37/12; H01J37/153; H01J37/29; H01L21/66; (IPC1-7): H01J37/09; G01B15/00; G01N23/225; G21K1/02; G21K5/04; H01J37/12; H01J37/153; H01L21/66

JP2001242104A
JP4068519A

Masatake Shiga
Tadashi Takahashi
Masakazu Aoyama
Kazuya Nishi

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