CHEMICAL LIQUID AND METHOD FOR PROCESSING SUBSTRATE USING THE SAME

Title:

CHEMICAL LIQUID AND METHOD FOR PROCESSING SUBSTRATE USING THE SAME

Document Type and Number:

Japanese Patent JP2009063649

Kind Code:

A

Abstract:

To provide a chemical liquid that facilitates a smooth developing process of an organic film pattern in the second time and afterward.

The surface of an organic film pattern 4 formed on a substrate 1 includes an inhibition layer comprising a modified layer by modification of the surface portion of the organic film pattern 4 and a deposition layer by deposition of a substance on the surface of the organic film pattern 4. The inhibition layer is removed by using a chemical liquid comprising tetraalkylammonium hydroxide, alkanolamine, sugar alcohol having a carbon number of not less than 5, at least one kind selected from acids and acidic salts, and the balance water, and showing a rate of not more than 2,000 /min for dissolving the organic film pattern 4 in a portion except for the inhibition layer.

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Inventors:

KIDO SHUSAKU
YASUE HIDEKUNI
NISHIJIMA SUMITAKA

Application Number:

JP2007229125A

Publication Date:

March 26, 2009

Filing Date:

September 04, 2007

Export Citation:

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Assignee:

NEC LCD TECHNOLOGIES LTD
NAGASE CHEMTEX CORP

International Classes:

G03F7/40; G03F7/42; H01L21/027

Domestic Patent References:

JP2005208329A	2005-08-04
JP2005049752A	2005-02-24
JPH1184686A	1999-03-26

Attorney, Agent or Firm:

Akio Miyazaki
Ishibashi Masayuki
Masaaki Ogata

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