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Title:
CHEMICAL PROCESS FOR GLASS SUBSTRATE AND APPARATUS FOR THE SAME
Document Type and Number:
Japanese Patent JP3524540
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a method and an apparatus for a chemical processing for a glass substrate for a various flat panel display capable of recycling of a glass, and whose surface is uniform and smooth regardless of a size of the glass substrate, a reduced thickness of a glass substrate.
SOLUTION: An ascending current of a chemical processing fluid accompanied by a bubble generates from a bottom of a storage vessel 11 of the chemical processing liquid whose main component is a hydrofluoric acid. The glass substrate is soaked in this processing fluid, and a part or all of one side of an exterior of the glass substrate is processed or a part or all of both sides of the exterior is processed.


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Inventors:
Nishiyama, Toshihiro
Deguchi, Mikiro
Itokawa, Katsuhiro
Kotani, Makoto
Mizoguchi, Koichi
Application Number:
JP2002110829A
Publication Date:
May 10, 2004
Filing Date:
April 12, 2002
Export Citation:
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Assignee:
NISHIYAMA STAINLESS CHEM KK
International Classes:
G02F1/13; C03C15/00; C03C15/02; G02F1/1333; H01J9/24; H01J17/16; (IPC1-7): C03C15/02; C03C15/00; G02F1/13; G02F1/1333; H01J9/24; H01J17/16
Attorney, Agent or Firm:
野中 誠一



 
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