Title:
CHEMICALLY AMPLIFYING NEGATIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JPH11218919
Kind Code:
A
Abstract:
To provide the chemically amplifying negative resist composition capable of forming a profile-shaped resist pattern having good rectangular sectional forms and superior in sensitivity to radiation.
This resist composition comprises an alkali-soluble resin, (B) a compound generating an acid by irradiation with radiation, and (C) a cross- linking agent, and (D) a halo acid generator of tris(halogenoalkyl) isocyanurate together with (E) bis(cyclohexylsulfonyl)-diazomethane in a mixture having the weight ratio of (D): (E) of 20:1-1:2 as the component (B), and (F) at least one of tris(2,3-dibromopropyl) isocyanurate and tris(2,3-dibromo-4-chlorobutyl) isocyanurate is used as (D) tris-(halogenoalkyl) isocyanyrate.
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Inventors:
TACHIKAWA TOSHIKAZU
KANEKO FUMITAKE
FUJIMURA SATOSHI
MIYAIRI YOSHIKAZU
KOMANO HIROSHI
NAKAYAMA TOSHIMASA
KANEKO FUMITAKE
FUJIMURA SATOSHI
MIYAIRI YOSHIKAZU
KOMANO HIROSHI
NAKAYAMA TOSHIMASA
Application Number:
JP2318298A
Publication Date:
August 10, 1999
Filing Date:
February 04, 1998
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/004; G03F7/038; (IPC1-7): G03F7/038; G03F7/004
Attorney, Agent or Firm:
Agata Akira (1 person outside)
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