Title:
PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JPH11218916
Kind Code:
A
Abstract:
To provide the photopolymerization type photosensitive composition developable in an alkaline aqueous solution substantially containing no organic solvent and hardly subjected to oxygen inhibition and superior in gradation and solvent resistance and wide in development latitude.
This photosensitive composition comprises an alkali-soluble resin and a polymerizable compound having at least 2 unsaturated double bonds and a photopolymerization initiator, and this alkali-soluble resin is a copolymer mainly of N-p-toluene-sulfonyl-methacrylamide or 2-(p-toluenesulfonylurethane)- ethyl methacrylate and vinylpyrrolidone.
Inventors:
TAGASHIRA KUNIHIRO
NATORI SHIGERU
ASANO TAKATERU
NATORI SHIGERU
ASANO TAKATERU
Application Number:
JP3671898A
Publication Date:
August 10, 1999
Filing Date:
February 03, 1998
Export Citation:
Assignee:
FUJI YAKUHIN KOGYO KK
International Classes:
G03F7/033; C08F2/50; C09D4/06; G03F7/00; (IPC1-7): G03F7/033; C08F2/50; G03F7/00
Attorney, Agent or Firm:
Nobuo Kaida (2 outside)