PURPOSE: To obtain an equipment which facilitates maintaining the concentration of an agent and the concentrations of organic substances, metal impurities and fine particles in the agent and pure water for a long time and washing wafers uniformly by a method wherein a washing bath, an overflow apparatus, a pump, an ultraviolet pasteurizer, a gas-liquid separator, a filter, densitometers, an automatic supply means and so forth are provided.
CONSTITUTION: At least a washing bath 22, an overflow apparatus 13 which precipitates and filters impurities in washing solution, a pump 11 which pumps up the washing solution from the washing bath 22 and supplies to the overflow apparatus 13, an ultraviolet pasteurizer 28, a gas-liquid separator 29 and a filter 12 which are provided at the intermediate part of a pipe connecting the pump 11 to the overflow apparatus 13 and a means which supplies pure water and agent to the washing bath 22 to dilute or concentrate the washing solution automatically in accordance with the outputs of densitometers 30 and 30' are provided. Further, for instance, a stirrer 23 using nitrogen gas and a liquid level sensor 19 for stabilizing the liquid level are provided in the washing bath 22 and a liquid container 14 in which the agent is stored, a nozzle 16 which can be inserted into and drawn out of the container 14 by an air cylinder 15, a weighing bath 18 and a depressurizer 17 are provided in a chemicals feeder 33.
| JP2023532355 | Processing station and method for processing workpieces |
| WO/1990/001379 | APPARATUS FOR CLEANING DISCRETE ARTICLES |
KOMATSU KAZUSHIGE
BABA HIROYUKI
FUJIE NOBUO
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