Title:
CLEANING COMPOSITIONS FOR METAL SUBSTRATES
Document Type and Number:
Japanese Patent JP2022023177
Kind Code:
A
Abstract:
To provide an alkaline metal cleaner which does not produce smut, is efficient in increasing adhesion of subsequent coatings in a metal finishing process, does not require many steps for application, and/or can be applied at room temperature.SOLUTION: A composition to be applied to a metal substrate comprises an aqueous carrier, a hydroxide anion and/or a phosphate anion, and a corrosion inhibitor comprising an azole compound, rare earth ions, alkaline earth metal ions, and/or transition metal ions. A substrate or article includes the composition to be applied to a metal substrate and a coating on the composition. A method of fabricating a substrate comprises applying the composition to a substrate, drying the composition to form a dried composition, and applying a coating on the dried composition.SELECTED DRAWING: None
Inventors:
ERIC L MORRIS
Application Number:
JP2021175724A
Publication Date:
February 07, 2022
Filing Date:
October 27, 2021
Export Citation:
Assignee:
PRC DESOTO INT INC
International Classes:
C11D7/32; C11D3/08; C11D3/20; C11D3/28; C11D3/36; C11D7/14; C11D7/26; C11D7/36; C23G1/18; C23G1/22
Domestic Patent References:
| JP2007536707A | 2007-12-13 | |||
| JP2002523612A | 2002-07-30 | |||
| JP2004067977A | 2004-03-04 | |||
| JPH059764A | 1993-01-19 |
Foreign References:
| US20050059565A1 | 2005-03-17 |
Attorney, Agent or Firm:
Asamura patent office