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Title:
CHUCKS AND CLAMPS FOR HOLDING OBJECTS OF LITHOGRAPHIC APPARATUS, AND METHODS FOR CONTROLLING TEMPERATURE OF OBJECT HELD BY CLAMP OF LITHOGRAPHIC APPARATUS
Document Type and Number:
Japanese Patent JP2022023178
Kind Code:
A
Abstract:
To provide chucks and clamps for holding objects of a lithographic apparatus, and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus.SOLUTION: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.SELECTED DRAWING: Figure 16

Inventors:
KOEVOETS ADRIANUS HENDRIK
RAYMOND WILHELMUS LOUIS LAFARRE
MICHAEL LEO NELSON
JACOBUS CORNELIS GERARDUS VAN DER SANDEN
MICHAEL ANDREW CHIEDA
TAMMO UITTERDIJK
O'CONNER GEOFFREY
Application Number:
JP2021175870A
Publication Date:
February 07, 2022
Filing Date:
October 27, 2021
Export Citation:
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Assignee:
ASML HOLDING NV
ASML NETHERLANDS BV
International Classes:
G03F7/20
Domestic Patent References:
JP2006148101A2006-06-08
JPH11135407A1999-05-21
JPH07106244A1995-04-21
JP2015035448A2015-02-19
JP2007142238A2007-06-07
JP2009200486A2009-09-03
Foreign References:
WO2014122151A22014-08-14
CN103904014A2014-07-02
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito