Title:
CLEANING DEVICE FOR SEMICONDUCTOR WAFER
Document Type and Number:
Japanese Patent JPS59211233
Kind Code:
A
Abstract:
PURPOSE:To contrive saving of the pure water, uniformity of the cleaning effect and improve of the element characteristics by restraining supply of the pure water when the preset time has passed or when a specific resistance of the pure water in a running water tank reaches the predetermined value. CONSTITUTION:Wafers are set in a running water tank 11 and a start SW20 is turned on to start a timer 21. At the same time, the air opens an air valve 16 through an electric equipement 18 and the pure water flows into the running water tank 11. When the preset time of the timer 21 has passed or when a specific resistance of the pure water in the running water tank 11 obtained by a sensor 15 reaches the preset value, a buzzer 22 sounds and the air valve 16 is almost closed to restrain a supply of the pure water. In order to supply the minimum quantity of the pure water constantly without completely stopping the supply of pure water, multiplication of bacteria in the running water tank 11 is prevented, thereby preventing unpreferable effect upon the element.
Inventors:
SAITOU KIYOSHI
YADA HIDETOSHI
INOKUCHI SEIJI
YADA HIDETOSHI
INOKUCHI SEIJI
Application Number:
JP8605983A
Publication Date:
November 30, 1984
Filing Date:
May 17, 1983
Export Citation:
Assignee:
TOSHIBA KK
International Classes:
H01L21/304; H01L21/00; (IPC1-7): H01L21/304
Attorney, Agent or Firm:
Takehiko Suzue