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Title:
CLEANING LIQUID, CLEANING METHOD, AND CLEANING LIQUID PRODUCTION DEVICE
Document Type and Number:
Japanese Patent JP2011088979
Kind Code:
A
Abstract:

To provide a cleaning liquid capable of keeping high-concentration gas stably in a liquid over a long period and exhibiting high cleaning performance.

In the cleaning liquid, nano-size gas bubbles exist in a saturation solution of the gas. The cleaning liquid comprises a liquid formed of molecules forming a hydrogen bond, and the distance of hydrogen bond of molecules in the interface between the liquid and the bubbles is shorter than that of the hydrogen bond in a liquid at ordinary temperature and pressure. By controlling a pressure change, a temperature change, shock waves, ultrasonic waves, infrared rays, and vibration, the bubbles in the cleaning liquid are collapsed for cleaning. The cleaning liquid is produced by a cleaning liquid production device including a gas supplying part 2, a gas-liquid mixing part 3, a gas separating part 4, and a pressure reducing part 5.


Inventors:
YAMAMOTO HIROSHI
TSUJI ATSUSHI
MAEKAWA TETSUYA
HIROTA SHINYA
HOJO TSUKASA
NAKAGAWA NAOHARU
SATO MASAKI
IMANARI KIKO
Application Number:
JP2009242419A
Publication Date:
May 06, 2011
Filing Date:
October 21, 2009
Export Citation:
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Assignee:
PANASONIC ELEC WORKS CO LTD
International Classes:
C11D7/02; B01F3/04; B01F5/04; B08B3/08; B08B3/10; C02F1/50; C02F1/68
Attorney, Agent or Firm:
Keisei Nishikawa