Title:
CLOTH APPLICATION DEVICE OF SEWING MACHINE
Document Type and Number:
Japanese Patent JP3652794
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To enable to appropriately apply cloth in proportion to its thickness by changing positions of the guide channel of a guide mechanism between thick and thin cloth control positions.
SOLUTION: A guide mechanism 35 is composed of a guide cam 36 having a guide channel 37 and a guide piece 39 to move along the guide channel 37 in which the guide piece 39 moves around by being put through in the guide channel processed like a groove. Bottom of the guide cam 36 is put in axis of a pin 38 onto a base frame 38 so that the guide cam 36 is able to inclinedly turn round the axis of the attached point. A drive device to change the position of the guide channel 37 in the guide cam 36 onto a required position on an application plate 26 has a drive lever 45 onto a drive shaft 44 capable of turning round free, of which top is connected to the guide cam 36 through a link 46, and moves the guide cam 36 round in axis of the pin 38 by a roll of the drive shaft 44. It is as well possible to move the drive lever 45 by a roll of a placer 47 applied onto a shaft body 48 to form an eccentric cam.
More Like This:
| JPH0984981 | SEWING MACHINE |
Inventors:
Keiichi Aoki
Application Number:
JP17571696A
Publication Date:
May 25, 2005
Filing Date:
June 14, 1996
Export Citation:
Assignee:
Baldan Co., Ltd.
International Classes:
D05B29/02; (IPC1-7): D05B29/02
Domestic Patent References:
| JP7178272A | ||||
| JP5300988A | ||||
| JP3205095A | ||||
| JP824455A | ||||
| JP7231991A | ||||
| JP6238078A |
Attorney, Agent or Firm:
Tomoko Nakajima
Hiroshi Satake
Hiroshi Satake
Previous Patent: VOLTAGE CONVERSION CIRCUIT FOR SEMICONDUCTOR DEVICE
Next Patent: ELECTRON BEAM VACUUM CONTAINER
Next Patent: ELECTRON BEAM VACUUM CONTAINER