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Title:
化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7261654
Kind Code:
B2
Abstract:
To provide a compound and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).SOLUTION: The compound represented by formula (I) and the resist composition containing the compound are provided. Rrepresents hydrogen or a methyl group, and Xrepresents a group represented by a specific formula.SELECTED DRAWING: None

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Inventors:
Masahiko Shimada
Koji Ichikawa
Application Number:
JP2019091608A
Publication Date:
April 20, 2023
Filing Date:
May 14, 2019
Export Citation:
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Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F20/26; C07D303/16; C07D305/06; C08F12/22; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
JP2017095444A
JP2018062509A
JP2013092590A
JP2012252316A
JP2011509340A
JP2019142858A
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP



 
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