Title:
CROSS-LINKED POLYMER
Document Type and Number:
Japanese Patent JP3495503
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a binder for a DUV photoresist which has high work stability, high contrast and excellent resolution.
SOLUTION: A polymer, which is insoluble in an aqueous alkaline developer and contains a constitutive unit of a formula I (in the formula, R2 is hydrogen, C1 to C18 alkyl, C5 to C10 cycloalkyl, C5 to C14 aryl and C6 to C30 aralkyl, and R3 is C1 to C18 alkyl, C5 to C10 cycloalkyl, C5 to C14 aryl or C6 to C30 aralkyl, and this can be an alkyl, cycloalkyl or aralkyl group substituted with one or more hydroxyl groups or nitro groups or with one ore more halogen atoms by a desire, and X is a (k) + monovalent organic group, and (k) is the number of 1 to 5, and 1 is the number of 0 to 4) and on which a cloven product material obtained by reaction with acid is a quantity soluble in an aqueous alkaline developer, is proper as a binder for a DUV photoresist which has high work stability, high contrast and excellent resolution.
Inventors:
Hans-Thomas Sheach
Norbert Miyunzel
Norbert Miyunzel
Application Number:
JP9848796A
Publication Date:
February 09, 2004
Filing Date:
April 19, 1996
Export Citation:
Assignee:
OLIN MICROELECTRONIC CHEMICALS,INC.
International Classes:
C08F8/00; C08F12/22; C08F212/00; C08G65/00; C08G65/34; C08G65/40; C08G83/00; G03F7/004; G03F7/039; H01L21/027; H05K3/06; (IPC1-7): C08F8/00; C08F12/22; C08G65/00; C08G83/00; G03F7/004; G03F7/039; H01L21/027; H05K3/06
Other References:
【文献】米国特許4713441(US,A)
Attorney, Agent or Firm:
Chika Takagi (1 person outside)