To provide a diamond tool suitable for fine processing of a nanometer order.
Small projections 6 of diamond are manufactured in at least a part of a base body surface 6a by a CVD method, and are arranged in a plurality. The height of the small projections is a range of 1 μm to 1 mm. Its shape is formed in a shape provided with a shape provided by anisotropic etching of silicon such as a quadrangular pyramid shape, a triangular column shape a quadrangular column shape and a trapezoidal shape as a female mold 3. The small projections of the diamond are manufactured by chemically dissolving a silicon mold by vapor-depositing the diamond on this mold by a gaseous phase synthesizing method by forming a silicon wafer as the silicon mold 4 by removing a mask pattern after forming the female mold of the small projections by the anisotropic etching of the silicon after forming the prescribed mask pattern 2 on the silicon wafer 1 in the first place, and this diamond tool 5 is provided.
YAMADA SHIGERU
TAKANO NOBORU
OYAMA TATSUO
HAYASHI HIROKI
TAKANO SHIGETO
KANDA KAZUTAKA
NACHI FUJIKOSHI CORP
Next Patent: METHOD OF MANUFACTURING ELECTRODEPOSITION TOOL