Title:
ダイレクトイメージング露光装置及びダイレクトイメージング露光方法
Document Type and Number:
Japanese Patent JP7023601
Kind Code:
B2
Abstract:
[Problem] To enable resolution to be effectively increased beyond a conventional resolution limit such that the pattern of applied light approaches a designed exposure pattern as much as possible. [Solution] Light in an exposure pattern is applied to an exposure area E by an exposure unit provided with a spatial light modulator that is a DMD, and while an object W is being moved through the exposure area E by a moving mechanism, a photosensitive layer at the surface of the object W is exposed by applying light having a critical exposure amount or more thereto. A point to be exposed of the object W is located at corresponding coordinates G corresponding to a pixel mirror in an on state of the spatial light modulator at multiple times and multiply exposed. The number of times of multiple exposure at an exposure point the distance of which to the boundary of a designed exposure pattern is less than an exposure point pitch is smaller than a maximum number of times set according to the distance to the boundary.
Inventors:
Suzuki Shoji
Application Number:
JP2016221962A
Publication Date:
February 22, 2022
Filing Date:
November 14, 2016
Export Citation:
Assignee:
Adtech Engineering Co., Ltd.
International Classes:
G03F7/20
Domestic Patent References:
| JP2005203697A | ||||
| JP2010156901A | ||||
| JP2013543647A | ||||
| JP2008076590A | ||||
| JP2004212471A | ||||
| JP2006179921A | ||||
| JP2011066087A | ||||
| JP2005123234A |
Foreign References:
| WO2005022263A2 | ||||
| WO1994028574A1 | ||||
| WO2008122419A1 |
Attorney, Agent or Firm:
Koichi Hotate
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