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Title:
DISCHARGE NOZZLE FOR PROCESS LIQUID AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2013066829
Kind Code:
A
Abstract:

To provide a long-length discharge nozzle for a process liquid excellent in attachability/detachability and maintenance performance, and not deflecting without a beam type nozzle holding mechanism.

A deflection correction mechanism 74 mounted to the discharge nozzle 64 for a process liquid includes: first and second intermediate joint parts 78 and 80 projectingly provided on a reinforcing surface 68a at first and second intermediate points PM1 and PM2 of a nozzle header pipe 68; a central joint part 76 projectingly provided on the reinforcing surface 68a between the first and second intermediate joint parts 78 and 80 of the nozzle header pipe 68, for example, at a center point Pc in a longitudinal direction; a first connecting rod 82 laid between the central joint part 76 and the first intermediate joint part; and a second connecting rod 84 laid between the central joint part 76 and the second intermediate joint part 80.


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Inventors:
KODAMA MUNEHISA
MIYAZAKI KAZUHITO
Application Number:
JP2011205868A
Publication Date:
April 18, 2013
Filing Date:
September 21, 2011
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
B05B1/20; B05B15/60; B05B15/658; B08B3/02; G02F1/13; H01L21/304
Attorney, Agent or Firm:
Filial piety Sasaki