Title:
ELECTRON BEAM IRRADIATION PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP3900996
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an electron beam irradiation processing device allowing accurate measurement of the quantity of electron beam emitted from an electron beam tube by reducing generation of the abnormal plasma inside a chamber due to introduction of a power supply line, which is used for supplying electric power to a power driving part such as a heater, into the chamber.
SOLUTION: This electron beam irradiation processing device, in which electric power is supplied from an alternating current power source 111 to the power driving part 119 inside the chamber 10, a workpiece 13 is irradiated with electron beams emitted from the electron beam tube 1 toward the inside of the chamber 10, and a part of the emitted electron beams is detected for controlling 7, 8, 9, 2, 3, and 101 and electron beams emitted from the electron beam tube 1, is characterized in that the electric power is supplied to the power driving part 119 via a shield transformer 114 from the alternating current power source 111.
Inventors:
Ichiyu Koike
Masanori Yamaguchi
Hironari Haneda
Masanori Yamaguchi
Hironari Haneda
Application Number:
JP2002105543A
Publication Date:
April 04, 2007
Filing Date:
April 08, 2002
Export Citation:
Assignee:
Ushio, Inc.
International Classes:
G21K5/04; C23C14/30; (IPC1-7): G21K5/04; C23C14/30
Domestic Patent References:
| JP2001221898A | ||||
| JP2003229353A | ||||
| JP62237653A | ||||
| JP60048661U | ||||
| JP64074001A | ||||
| JP9167690A | ||||
| JP2000306540A |
Attorney, Agent or Firm:
Koji Shichijo