ロケーションスペシフィック処理における予測システム誤差補正を実装する装置及び方法

Japanese Patent JP7013539

B2

A method of modifying an upper layer of a workpiece using a gas cluster ion beam (GCIB) is described. The method includes collecting parametric data relating to an upper layer of a workpiece, and determining a predicted systematic error response for applying a GCIB to the upper layer to alter an initial profile of a measured attribute by using the parametric data. Additionally, the method includes identifying a target profile of the measured attribute, directing the GCIB toward the upper layer of the workpiece, and spatially modulating an applied property of the GCIB, based at least in part on the predicted systematic error response and the parametric data, as a function of position on the upper layer of the workpiece to achieve the target profile of the measured attribute.

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La Gana-Gizzo, Vincent
Russell, Noel
La Rose, Joshua
Chae, Sue Doo

JP2020160585A

January 31, 2022

September 25, 2020

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TEL Epion Incorporated

H01L21/265; H01J37/20; H01J37/28; H01J37/317; H01L21/302

JP2010524155A
JP2004022676A

Tadashige Ito
Tadahiko Ito
Shinsuke Onuki

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