Title:
EXPOSURE METHOD AND EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2008091793
Kind Code:
A
Abstract:
To provide an exposure method and an exposure device, capable of locally optimizing such factors as incident angle, polarizing direction, and exposure amount, according to places in a sample when patterning the solid sample having a rough on its surface.
When a solid sample 1 having a rough on its surface is subjected to a lithography processing, the incident light 2 is inclined within the range of 10 to 60 relative to the normal direction of a substrate surface of the solid sample 1 for exposure, in an exposure process in which a resist is applied for patterning. Here, the amount of exposure may be varied partially depending on the place in the solid sample 1. The incident light 2 whose polarizing direction 4 is controlled may be used.
Inventors:
SASAKI MINORU
HANE KAZUHIRO
HAYASHI HIROKI
HANE KAZUHIRO
HAYASHI HIROKI
Application Number:
JP2006273326A
Publication Date:
April 17, 2008
Filing Date:
October 04, 2006
Export Citation:
Assignee:
UNIV TOHOKU
USHIO ELECTRIC INC
USHIO ELECTRIC INC
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JPH06291018A | 1994-10-18 | |||
| JPH0269604A | 1990-03-08 | |||
| JP2003163150A | 2003-06-06 | |||
| JP2000058786A | 2000-02-25 | |||
| JPS4432754B1 | ||||
| JPS56133873A | 1981-10-20 | |||
| JPS56114326A | 1981-09-08 | |||
| JPH10154658A | 1998-06-09 | |||
| JP2000122302A | 2000-04-28 | |||
| JPH10270320A | 1998-10-09 | |||
| JP2004513528A | 2004-04-30 | |||
| JPH05226226A | 1993-09-03 |
Foreign References:
| WO1999008314A1 | 1999-02-18 |
Attorney, Agent or Firm:
Atsushi Suda
Shuji Kusunoki
Shuji Kusunoki
Previous Patent: PALETTE FOR CONVEYING SUBSTRATE
Next Patent: MAGNETIC MEMORY CELL AND MAGNETIC RANDOM ACCESS MEMORY
Next Patent: MAGNETIC MEMORY CELL AND MAGNETIC RANDOM ACCESS MEMORY