Title:
EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP3952736
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an exposure method comprising an exposure correction method for correcting variations in dimensions caused by a density difference of a pattern which occurs during processing in addition to a proximity effect correction and fogging exposure correction.
SOLUTION: The method relates to the exposure and transfer of a transfer pattern to an object to be transferred by an electron beam drawing apparatus. In correcting dimensional errors of a transfer pattern caused by a density difference of an original transfer pattern, when adopting a correction method of modulating the exposure of a drawing by an area ratio, the method has a step of setting a first area ratio α1 of a transferring pattern which targets a small area of a mask area and a second area ratio α2 of a transferring pattern which targets an area larger than the mask area targeted by the first area ratio to each correction cell, a step of setting one modulation parameter to each of various combinations of the first area ratio and the second area ratio based on a predetermined relationship, and a step of acquiring basic exposure ×modulation parameter = correction exposure to define the acquired exposure as drawing exposure.
Inventors:
Shunichiro Sato
Application Number:
JP2001327374A
Publication Date:
August 01, 2007
Filing Date:
October 25, 2001
Export Citation:
Assignee:
ソニー株式会社
International Classes:
H01L21/027; G03F1/20; G03F1/68; G03F7/20; (IPC1-7): H01L21/027; G03F1/08; G03F1/16; G03F7/20
Domestic Patent References:
| JP11204415A | ||||
| JP11154635A | ||||
| JP10010701A | ||||
| JP2001057331A | ||||
| JP8328236A |
Attorney, Agent or Firm:
Yoshitsuno Kakuda
Hironobu Isoyama
Hironobu Isoyama
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