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Patent Searching and Data


Title:
FOREIGN SUBSTANCE DETECTION IN SEMICONDUCTOR MANUFACTURE APPARATUS
Document Type and Number:
Japanese Patent JPS62213262
Kind Code:
A
Abstract:

PURPOSE: To facilitate detection of a translucent organic foreign substance and improve the ability of foreign substance detection by a method wherein exciting light is applied to a mask to be inspected with the optimum angle and both reflected light and fluorescent light emitted from the foreign substance are detected.

CONSTITUTION: When no foreign substance exists on a mask 8 to be inspected, exciting light 91 from an exciting light oscillator 9 is reflected normally by the surface of the mask and does not enter an exciting light detector 10 and a fluorescent light detector 11. When a foreign substance 81 exists, if the foreign substance 81 is an inorganic substance which does not emit fluorescent light, the exciting light 91 applied to the foreign substance 81 is scattered and detected by the exciting light detector 10 so that the existence of the foreign substance 81 can be recognized. If the foreign substance 82 is a translucent organic substance, the exciting light 91 itself is transmitted through the foreign substance 82 but fluorescent light 92 which is excited by the light 91 is emitted and detected by the fluorescent light detector 11 so that the existence of the foreign substance 82 can be recognized.


Inventors:
TAKAHATA OSAMU
Application Number:
JP5497986A
Publication Date:
September 19, 1987
Filing Date:
March 14, 1986
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
H01L21/66; G01N21/88; G01N21/94; G01N21/956; G03F1/84; H01L21/027; H01L21/30; (IPC1-7): H01L21/30; H01L21/66
Attorney, Agent or Firm:
Saburo Kimura (1 outside)