To provide a high quality color filter in which a colored layer is formed even on a light-shielding layer without impairing flatness in the method of manufacturing a color filter (a pointing BM method).
When a colored layer of a color filter consisting of a prescribed pattern colored layer and light-shielding layer on a transparent substrate having a conductive layer, is formed by an electro-deposition method, the light-shielding layer pattern is formed on the transparent substrate beforehand by using a light-shielding material before the colored layer is formed, a baking temperature is lowered or a baking time is shortened so that an electro-deposition resistance per a unit cm2 of the light-shielding layer becomes not lower than 105Ω and a current value at the time of measuring the resistance becomes not exceeding 1 mA. Further, when the coloring layer is formed by electro-deposition method, it is prevented that the coloring layer is formed on the light-shielding layer superimposed, by increasing the light-shielding layer in the thickness.
SASAKI REIKO
OKADA YOSHIKATSU
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