Title:
FORMATION OF PLATED ELECTRODE FOR ELECTROCHROMIC ELEMENT
Document Type and Number:
Japanese Patent JPH04295830
Kind Code:
A
Abstract:
PURPOSE:To obtain the method for forming plated electrodes which can form the plated electrodes for an electrochromic element (EC element) with good positional accuracy. CONSTITUTION:After a masking material 3 is applied over the entire surface of a substrate 1, the substrate is subjected to ball lapping to a prescribed outer peripheral shape. The masking material 3 is applied again at the prescribed point in the outer peripheral part of the substrate subjected to the ball lapping and thereafter, the respective masking materials 3 are removed. After the masking material 3 is applied over the entire surface of the substrate 1, the prescribed outer peripheral shape is subjected to the ball lapping, by which the formation of the outer peripheral shape and the peeling of the masking material from the end face to be plated are simultaneously executed. The plated electrodes 4 for the EC element are thus formed with the good positional accuracy.
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Inventors:
ENDO TATSUO
SAITO TADAHIKO
SAITO TADAHIKO
Application Number:
JP10372091A
Publication Date:
October 20, 1992
Filing Date:
March 25, 1991
Export Citation:
Assignee:
NIKON CORP
International Classes:
G02C7/10; G02F1/15; G02F1/155; (IPC1-7): G02C7/10; G02F1/15; G02F1/155
Attorney, Agent or Firm:
Masatoshi Sato (1 person outside)