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Title:
FORMATION OF SUPERCONDUCTING THIN FILM
Document Type and Number:
Japanese Patent JPH01133903
Kind Code:
A
Abstract:
PURPOSE:To form a superconductive thin film contg. Ba with high reproducibility when the superconductive thin film contg. Ba is formed on a substrate by sputtering, by using a BaF target as one of targets used. CONSTITUTION:When targets 6 are placed opposite to a substrate 4 and a superconductive thin film contg. Ba is formed on the substrate 4 by sputtering in vacuum, a BaF target is used as one of the targets 6. This method may be applicable to the formation of a Y-Ba-Cu-O superconductive thin film. Since BaF is chemically stable in the air, the superconductive thin film contg. Ba can be formed with high reproducibility.

Inventors:
KOJIMA KAZUYOSHI
KANEMOTO KYOZO
NOGUCHI TAKU
OOKAWA KUNIO
TAKAMI TETSUYA
TSUKADA NORIAKI
Application Number:
JP29271187A
Publication Date:
May 26, 1989
Filing Date:
November 18, 1987
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
C01B13/14; C01G1/00; C01G3/00; C04B41/87; C23C14/08; H01B12/06; H01B13/00; H01L39/24; (IPC1-7): C01B13/14; C01G3/00; C04B41/87; C23C14/08; H01B12/06; H01B13/00; H01L39/24
Attorney, Agent or Firm:
Masuo Oiwa (2 outside)



 
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