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Title:
FORMING METHOD OF THIN FILM PATTERN
Document Type and Number:
Japanese Patent JPH03135092
Kind Code:
A
Abstract:

PURPOSE: To flatten the installation of a pattern and to form the pattern in a multilayer by laminating metal layers by anodizing a metal film formed on a board, and providing an insulating layer and the pattern at predetermined positions.

CONSTITUTION: An electrode laser 2 is laminated on one side surface of a board 1, a first metal layer 4 is laminated on the other side surface, a resist mask 5 is provided at a predetermined position of the layer 4, anodized to form an insulating layer 6, and a first metal layer pattern 4A is formed. A second metal layer 7 is laminated, similarly anodized to form the layer 6 at a predetermined position, and a second metal layer pattern 7A is formed. With this structure, the alternate lamination of the insulating layer and a conductor layer is not required. The patterns 4A, 7A can be formed without bending the installation of the pattern to simplify the steps and to flatten the pattern.


Inventors:
OZAKI TOKUICHI
SATO KAZUAKI
Application Number:
JP27395489A
Publication Date:
June 10, 1991
Filing Date:
October 20, 1989
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
H05K3/02; H05K3/46; (IPC1-7): H05K3/02; H05K3/46
Attorney, Agent or Firm:
Sadaichi Igita



 
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