Title:
GAS ABSORBING DEVICE
Document Type and Number:
Japanese Patent JP3223656
Kind Code:
B2
Abstract:
PURPOSE: To efficiently and accurately remove alkaline and acidic components in a gas, even if they are highly concentrated.
CONSTITUTION: An intermediate frame 14 is provided therein with an ammonia adsorbing material layer 10a with ammonium hydrogensulfate supported thereon disposed on the upstream side of ventilation direction and a hydrofluoric acid adsorbing material layer 10b with potassium carbonate supported thereon disposed on the downstream side thereof. A gas absorbing device is built up by a successive laying of a lower frame 24, a lower expand metal 26, a coarse filter 28, a second protecting sheet 20, the aforesaid intermediate frame 14, a first protecting sheet 18, an upper expand metal 30 and an upper frame 32 in that order and its structure is made up integrally by bolts 34. By the ammonia adsorbing material layer 10a, ammonia is adsorbed and hydrofluoric acid is adsorbed and desorbed and the hydrofluoric acid of an averaged concentration is adsorbed by the hydrofluoric acid adsorbing material layer 10b on the downstream side.
Inventors:
Toshihiko Izumi
Sasaki Norinori
Tsutomu Ohnuma
Ryoji Koshio
Atsushi Saiki
Sato et al.
Masataka Kasai
Sasaki Norinori
Tsutomu Ohnuma
Ryoji Koshio
Atsushi Saiki
Sato et al.
Masataka Kasai
Application Number:
JP20946293A
Publication Date:
October 29, 2001
Filing Date:
August 24, 1993
Export Citation:
Assignee:
Hitachi Plant Construction Co., Ltd.
International Classes:
B01D53/40; B01D53/04; B01D53/42; (IPC1-7): B01D53/42; B01D53/04; B01D53/40
Domestic Patent References:
| JP62183838A | ||||
| JP63130138A |
Attorney, Agent or Firm:
Atsushi Nakajima (1 person outside)