Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
GAS DISCHARGE APPARATUS OF REACTION CHAMBER
Document Type and Number:
Japanese Patent JP2012106877
Kind Code:
A
Abstract:

To provide a gas discharge apparatus capable of suppressing generation of a chemical synthetic composition containing a harmful substance such as a tar-like material in an exhaust part at low cost.

A gas discharge apparatus discharges a gas in a heating chamber 13 for forming a carbon nanotube by a vacuum pump 36. A cylindrical body 31 having a decompression chamber which is decompressed at a lower pressure than the heating chamber 13 is disposed in an exhaust gas route between the heating chamber 13 and the vacuum pump 36. At the same time, a cooler 34 is disposed at its downstream side.


Inventors:
HIRAOKA KAZUYUKI
SUGIMOTO ITSUO
TAKANABE KOJI
TAKITANI TOSHIO
KIRA KOJI
HARADA MAKI
IMASAKA REISHI
Application Number:
JP2010255432A
Publication Date:
June 07, 2012
Filing Date:
November 16, 2010
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI SHIPBUILDING ENG CO
International Classes:
C01B31/02
Domestic Patent References:
JPH06106040A1994-04-19
JPH1015378A1998-01-20
JPH06254375A1994-09-13
JP2002273198A2002-09-24
JPH1199327A1999-04-13
JPH06106040A1994-04-19
JPH1015378A1998-01-20
JPH06254375A1994-09-13
JP2002273198A2002-09-24
Attorney, Agent or Firm:
Yohei Harada
Yoshihiro Morimoto