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Title:
HEATING DEVICE FOR THIN FILM FORMATION SUBSTRATE
Document Type and Number:
Japanese Patent JP3049927
Kind Code:
B2
Abstract:

PURPOSE: To provide a substrate heating device which houses an infrared lamp heater comprising a ring-shaped infrared lamps concentrically laid out in one plane in a heater vessel whose one end is closed with a translucent quartz glass board and whose other end is provided with an opening communicated with open air and whose inner side is formed on a total reflected plane so as to house the heater and which is provided with a cylinderical reflector to be cooled with a cooling medium and capable of heating a substrate at a higher temperature.
CONSTITUTION: A communication hole 60 is formed longitudinally in the wall thickness of a peripheral wall of a reflector 3 while an ejection nozzle 61, which is connected to the tip of the communication hole 60 and opens to the inside of the reflector 3, is formed. An air supply manifold 62 having an ejection nozzle 63 through which cooling gas is blown at a terminal 21a of an infrared lamp, is installed within a space on the side of an opening 7a in a heater vessel so as to cool the infrared lamp and the terminal 21a with the cooling gas. Or a conic reflecting plane 70 is formed inside the reflector 3, thereby reducing the light quantum of the reflected light which emits light to the infrared lamp and the terminal.


Inventors:
Shinji Kiyofuji
Application Number:
JP5852592A
Publication Date:
June 05, 2000
Filing Date:
March 17, 1992
Export Citation:
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Assignee:
Fuji Electric Co., Ltd.
International Classes:
C23C16/46; H01L21/205; (IPC1-7): H01L21/205; C23C16/46
Domestic Patent References:
JP4186826A
JP4228569A
JP5136074A
JP63186424A
JP562907A
Attorney, Agent or Firm:
Masaharu Shinobe



 
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