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Title:
HIGH-PURITY FLUOROALKYLBENZENE DERIVATIVE AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2003321406
Kind Code:
A
Abstract:

To provide a method for producing a fluoroalkylbenzene derivative useful as a functional chemical intermediate for a medicine, an electronic material, etc., having reduced contents of residual halogens and residual metals being impurities by using a simple photohalogenation process and a halogen- fluorine exchange reaction process.

In the method for producing the fluoroalkylbenzene derivative by replacing the side chain of an alkylbenzene derivative with a halogen by a photohalogenation reaction and then subjecting the halogen-substituted alkylbenzene derivative to a halogen-fluorine exchange reaction with HF, an alkylbenzene derivative having ≤500 ppm calculated as each transition metal atom of transition metals of the group 3 to group 12 in the alkylbenzene derivative is used and HF in an amount of ≥10 times the molar amount of the halogen-substituted alkylbenzene derivative is used.


Inventors:
HIDAKA TOSHIO
FUSHIMI NORIO
YOSHIMURA TAKASHI
KAWAI KEN
Application Number:
JP2002128158A
Publication Date:
November 11, 2003
Filing Date:
April 30, 2002
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO
International Classes:
C07C29/136; C07B39/00; C07B61/00; C07C29/147; C07C29/62; C07C33/46; C07C37/56; C07C39/24; C07C45/41; C07C45/45; C07C45/63; C07C45/67; C07C47/55; C07C49/80; C07C51/04; C07C51/363; C07C51/62; C07C63/70; C07C67/14; C07C67/307; C07C69/76; C07C209/26; C07C211/29; C07C231/02; C07C233/65; C07C253/20; C07C255/49; C07C255/50; (IPC1-7): C07C29/136; C07C33/46; C07C37/56; C07C39/24; C07C45/41; C07C45/67; C07C47/55; C07C49/80; C07C51/04; C07C51/363; C07C63/70; C07C67/14; C07C69/76; C07C209/26; C07C211/29; C07C231/02; C07C233/65; C07C253/20; C07C255/49
Attorney, Agent or Firm:
Takashi Nagai