Title:
HYDROGEN GAS DETECTING DEVICE AND MANUFACTURING METHOD THEREOF
Document Type and Number:
Japanese Patent JP2002340830
Kind Code:
A
Abstract:
To provide a hydrogen gas detecting device capable of accurately, quickly and easily detecting a leakage of the hydrogen gas even under the non-oxygen environment such as the inert gas atmosphere and vacuum.
This hydrogen gas detecting device is provided with a first and a second insulating films 20 and 21 provided in a surface of a semiconductor substrate 10, a first detecting part 50 provided on the first insulating film 20 and having a first Pd thin film 30 mainly composed of Pd, and a second detecting part 51 provided on the second insulating film 21 and having a second Pd thin film 31 mainly composed of Pd and an electrode 43 formed of a conductor ohmic-connected to a back surface of the semiconductor substrate 10.
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Inventors:
YONEKURA YOSHIMICHI
KUREYA MASAYUKI
NOMARU YUJI
OKUDA AKIHISA
KUREYA MASAYUKI
NOMARU YUJI
OKUDA AKIHISA
Application Number:
JP2001141914A
Publication Date:
November 27, 2002
Filing Date:
May 11, 2001
Export Citation:
Assignee:
MITSUBISHI HEAVY IND LTD
International Classes:
G01N27/12; G01N27/22; (IPC1-7): G01N27/12; G01N27/22
Attorney, Agent or Firm:
Takehiko Suzue (5 outside)