Title:
INDUCTIVELY COUPLED PLASMA DEVICE
Document Type and Number:
Japanese Patent JP3819514
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain plasma frame output of large output with its superior stability and high efficiency by providing a third nozzle for axially introducing a plasma gas to the inside of an insulation tube on an axial end face on the internal side of the insulation tube of a grounding electrode.
SOLUTION: A gas introducing part 4 and a grounding electrode 5A are arranged on the top of an electric insulation tube 1. The grounding electrode 5A is provided with an axial gas introducing port 5a and an axial main nozzle 5c communicating therewith and supplying gas axially to the inside of the electric insulation tube 1. A flow rate of plasma gas supplied respectively from a diameter direction gas introducing port 4a and a circumferential gas introducing port 4b of a gas introducing port 4 and an axial gas introducing port 5a of a grounding electrode 5A can be individually adjusted by a gas flow rate adjusting valve 11. Thus, by introducing gas supplied axially, a heat movement quantity is increased axially of a plasma, and a stable plasma frame with its large heat output can be obtained.
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Inventors:
Yasushi Sakakibara
Genichi Katagiri
Genichi Katagiri
Application Number:
JP4271297A
Publication Date:
September 13, 2006
Filing Date:
February 26, 1997
Export Citation:
Assignee:
Fuji Electric Holdings Co., Ltd.
International Classes:
H05H1/30; B23K10/00; (IPC1-7): H05H1/30; //B23K10/00
Domestic Patent References:
| JP63135798U | ||||
| JP5168788A | ||||
| JP1140599A | ||||
| JP357199A | ||||
| JP8236293A | ||||
| JP3222416A | ||||
| JP61174107A |
Attorney, Agent or Firm:
Masaharu Shinobe