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Title:
LASER BEAM MACHINING APPARATUS, WORKING MASK, LASER BEAM MACHINING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP3842769
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a laser beam machining apparatus, which restrains peeling-off and cracking of an insulation film.
SOLUTION: The laser beam machining apparatus is provided with: a moving mechanism 9, which moves an object 20 to be machined in the scanning direction running from one end of the object 20 to the other end opposite to the one end; a beam-shape converting part 4, which converts a laser beam to a working laser beam having an asymmetrical shape about the scanning direction on a plane orthogonal to the optical axis of the laser beam; and an irradiation optical system 6, by which the object 20 is irradiated with the laser beam emitted from the beam-shape converting part 4.


Inventors:
Hiroshi Ikegami
Makoto Sekine
Application Number:
JP2003309338A
Publication Date:
November 08, 2006
Filing Date:
September 01, 2003
Export Citation:
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Assignee:
Toshiba Corporation
International Classes:
B23K26/066; B23K26/00; B23K26/06; B23K26/073; B23K26/364; H01L21/301; H01L21/302; H01L21/304; H01L21/311; H01L21/78; B23K101/40; (IPC1-7): B23K26/06; H01L21/301; H01L21/302; //B23K101:40
Domestic Patent References:
JP2001345536A
JP2000117465A
JP8019887A
JP9327782A
JP8220559A
JP2003037218A
JP2002224878A
JP2002324768A
JP7246487A
JP2001144035A
JP364043A
Attorney, Agent or Firm:
Hidekazu Miyoshi
Iwa Saki Kokuni
Kawamata Sumio
Nakamura Tomoyuki
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu